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Fine Line Metallization of Silicon Heterojunction Solar Cells via Collimated Aerosol Beam Direct Write

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dc.contributor.author Fink, Jacob Eugene
dc.description.abstract Solar energy has come to the forefront as a scalable and largely underutilized renewable energy resource. The current cost of solar electricity, namely from photovoltaics, along with other logistics factors, has prevented the widespread adaptation of the technology. A key determinant of efficiency and cost for a solar cell is the current collector grid. This work presents the Collimated Aerosol Beam Direct Write (CAB-DW) system as a non-contact printing method that can achieve current collector grid finger widths of less than 10 μm which are amenable to decreasing both resistive and optical losses. The ability to produce high aspect ratio grid fingers, and deposit optimized grid structures on high efficiency SHJ solar cells using silver nanoparticle inks is also demonstrated. A decrease in shadowing and via profile modification of the grid fingers is presented, along with a study of aging and degradation of electrical properties within silver nanoparticle inks.
dc.title Fine Line Metallization of Silicon Heterojunction Solar Cells via Collimated Aerosol Beam Direct Write en_US
dc.date.accessioned 2012-04-25T14:00:02Z
dc.date.available 2012-04-25T14:00:02Z
dc.date.issued 2012-04-25
dc.identifier.uri http://hdl.handle.net/10365/19621
dc.date 2012 en_US
dc.thesis.degree Master of Science. en_US
dc.contributor.advisor Akhatov, Iskander en_US
dc.subject.course Mechanical Engineering. en_US
dc.subject.course Master of Science / Mechanical Engineering, College of Engineering and Architecture, 2012. en_US

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