Synthesis of Small Silicon Carbide Nanocrystals in Low Pressure Nonthermal Plasma

Abstract

Nanoparticles have attracted much attention because of their unusual physical properties. This work represents original, incipient research into small crystalline silicon carbide nanoparticles synthesized in a low-pressure nonthermal plasma reactor. The nonthermal plasma technique offers a route for size-tunable synthesis of high-purity silicon carbide nanocrystals. Even though it has a high sublimation point, silicon carbide is synthesized in crystalline form in a nonthermal plasma reactor since nanoparticles are intensely heated by exothermic surface reactions on a nanoscale level. Using vaporized tetramethylsilane as a precursor and molecular hydrogen as an additive, both silicon carbide and silicon- or carbon-coated silicon carbide were created. Since plasma synthesis is a ligand-free process and charges on particles prevent agglomeration, silicon carbide is soluble in short-chain alcohols.